Fig. 2From: Significantly improved solvent tolerance of Escherichia coli by global transcription machinery engineeringSolvent tolerance of E. coli JM109 harboring σ70 mutant C9 and WT towards different concentrations of butanol (a), hexane (b), toluene (c), and butyl acetate (d) Strains JM109/pHACM-rpoD C9 and JM109/pHACM-rpoD WT were cultured at 37 °C. Different concentrations of butanol, hexane, toluene and butyl acetate were added when OD660 reached 0.2. Cell density was determined after 8 h of growthBack to article page